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China Manufacturer 10-16nm Nano Colloidal Silica

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    The results show that wafers after wiping out surface oxide in less than one hour without Ar clean process have the reduction about 10%~40% in sheet resistance, comparing with wafers with Ar clean. Ni(10%Pt) silicide is tested and verified at 0.5µm and 22nm structure. It has …

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  • FEB – Fresenius Environmental Bulletin

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